The thickness of the epitaxial layer, substrate, etching (residual layer), liquid crystal cell gap, and other semiconductor layers dramatically impacts...
The absolute reflectance measurement system automates the measurement of the spectral properties, film thickness, angle variation or other characteristics of...
Ellipsometry is a method for determining the refractive index and extinction coefficients of a sample by measuring the change in...
The MSV-5000 microscope system incorporates a double-beam scanning spectrophotometer for optimum measurements in the UV-Vis to NIR region (200-2700 nm).
The NRS Series of bench top are based on JASCO’s proven technology emphasizing sensitivity, reliability, and ease of operation...
Near Field Scanning
The NFS Series of scanning near-field optical microspectrometers have been optimized as a new solution for nanotechnology applications.
The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm.
A quantum efficiency measurement system for solid samples integrates the spectrofluorometer with an integrating sphere for fluorescence emission and a...
JASCO's Confocal fluorescence detector can be used to determine the depth of the fluorescent contaminant without destroying the crucible.
Phone: 0800 773 274
PO Box 17720